DINO TECHNOLOGY ACQUISITION LLC

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Patent Activity in the Last 10 Years

Technologies

Intl Class Technology Matters Rank in Class
 
  
 
G06F ELECTRIC DIGITAL DATA PROCESSING 20427
 
  
 
G06K RECOGNITION OF DATA; PRESENTATION OF DATA; RECORD CARRIERS; HANDLING RECORD CARRIERS 9189
 
  
 
G03F PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR 599
 
  
 
G01N INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES 1205

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Recent Publications

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Recent Patents

Patent # Title Filing Date Issue Date Intl Class
9696619 Technique for repairing a reflective photo-maskMar 11, 15Jul 04, 17[G06F, G03F]
9547233 Film-growth model using level setsMar 14, 13Jan 17, 17[G03F]
9494854 Technique for repairing an EUV photo-maskMar 14, 13Nov 15, 16[G06F, G03F]
9091935 Multistage extreme ultra-violet mask qualificationMar 11, 13Jul 28, 15[G06T, G03F, G06K]
9005852 Technique for repairing a reflective photo-maskFeb 11, 13Apr 14, 15[G06F, G03F]
8653454 Electron-beam image reconstructionJul 13, 11Feb 18, 14[G01N]
8644588 Photo-mask and wafer image reconstructionSep 19, 07Feb 04, 14[G06K]
8612903 Technique for repairing a reflective photo-maskFeb 09, 11Dec 17, 13[G06F]
8555214 Technique for analyzing a reflective photo-maskFeb 04, 11Oct 08, 13[G06F]
8463016 Extending the field of view of a mask-inspection imageFeb 05, 10Jun 11, 13[G06K]

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Expired/Abandoned/Withdrawn Patents

Patent # Title Status Filing Date Issue/Pub Date Intl Class
8245162 Write-pattern determination for maskless lithographyExpiredSep 08, 08Aug 14, 12[G06F]
8214775 System for determining repetitive work unitsExpiredSep 10, 08Jul 03, 12[G06F]
8111380 Write-pattern determination for maskless lithographyExpiredSep 08, 08Feb 07, 12[G03B]

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