Semiconductor Systems, Inc.

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Expired/Abandoned/Withdrawn Patents

Patent # Title Status Filing Date Issue/Pub Date Intl Class
5935768 Method of processing a substrate in a photolithography system utilizing a thermal process moduleExpiredJun 10, 97Aug 10, 99[G03F]
5885661 Droplet jet method for coating flat substrates with resist or similar materialsExpiredJul 26, 95Mar 23, 99[B05D, B05B]
5798140 Oscillatory chuck method and apparatus for coating flat substratesExpiredApr 30, 96Aug 25, 98[B05D]
5766824 Method and apparatus for curing photoresistExpiredJul 27, 95Jun 16, 98[G03F]
5651823 Clustered photolithography systemExpiredMar 29, 95Jul 29, 97[B65G]
5553994 Thermal process module for substrate coat/develop systemExpiredOct 11, 94Sep 10, 96[B65G]
5472502 Apparatus and method for spin coating wafers and the likeExpiredAug 30, 93Dec 05, 95[B05C]
5443348 Cassette input/output unit for semiconductor processing systemExpiredJul 16, 93Aug 22, 95[H01L]
5427820 Thermal control line for delivering liquid to a point of use in a photolithography systemExpiredJul 16, 93Jun 27, 95[B05C, B05B, B67D]
5392989 Nozzle assembly for dispensing liquidExpiredMay 24, 94Feb 28, 95[B05B]
5289222 Drain arrangement for photoresist coating apparatusExpiredJun 26, 92Feb 22, 94[G03D]

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