TECHNO SEMICHEM CO., LTD.
Patent Owner
Stats
- 9 US PATENTS IN FORCE
- 0 US APPLICATIONS PENDING
- Nov 25, 2014 most recent publication
Details
- 9 Issued Patents
- 0 Issued in last 3 years
- 0 Published in last 3 years
- 117 Total Citation Count
- Jan 06, 2005 Earliest Filing
- 10 Expired/Abandoned/Withdrawn Patents
Patent Activity in the Last 10 Years
Technologies
Intl Class
Technology
Matters
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Top Patents (by citation)
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Recent Publications
- No Recent Publications to Display
Recent Patents
Patent #
Title
Filing Date
Issue Date
Intl Class
8894876 Etchant for electrode and method of fabricating thin film transistor array panel using the sameAug 17, 10Nov 25, 14[C09K, H01L, C23F]
8388856 Electrolyte for rechargeable lithium battery including additives, and rechargeable lithium battery including the sameDec 21, 10Mar 05, 13[H01M, H01G]
8173546 Etchant composition, patterning conductive layer and manufacturing flat panel, display device using the sameJun 23, 11May 08, 12[H01L]
8092981 Negative photoresist composition and method of manufacturing array substrate using the sameDec 29, 08Jan 10, 12[H01L, G03F]
7985982 Etchant composition, patterning conductive layer and manufacturing flat panel, display device using the sameFeb 24, 09Jul 26, 11[H01L]
7851372 Composition for removing an insulation material, method of removing an insulation layer and method of recycling a substrate using the sameOct 02, 06Dec 14, 10[H01L]
7722926 Organometallic compounds and methods of forming thin films including the use of the sameJul 27, 06May 25, 10[C23C]
Expired/Abandoned/Withdrawn Patents
Patent #
Title
Status
Filing Date
Issue/Pub Date
Intl Class
2012/0045,697 ELECTROLYTE FOR RECHARGEABLE LITHIUM BATTERY, AND RECHARGEABLE LITHIUM BATTERY INCLUDING SAMEAbandonedAug 15, 11Feb 23, 12[H01M]
2011/0177,680 ETCHANT COMPOSITION FOR METAL WIRING AND METHOD OF MANUFACTURING THIN FILM TRANSISTOR ARRAY PANEL USING THE SAMEAbandonedOct 11, 10Jul 21, 11[C09K, H01L]
2011/0124,195 Chemical Mechanical Polishing Composition Containing Polysilicon Polish FinisherAbandonedJul 22, 09May 26, 11[C09K, H01L]
2011/0045,741 Auto-Stopping Abrasive Composition for Polishing High Step Height Oxide LayerAbandonedApr 28, 06Feb 24, 11[C09K, B24B]
2010/0176,335 CMP Slurry Composition for Copper Damascene ProcessAbandonedJun 08, 07Jul 15, 10[C09K]
2010/0015,807 Chemical Mechanical Polishing Composition for Copper Comprising ZeoliteAbandonedDec 20, 07Jan 21, 10[H01L]
2009/0298,289 Chemical Mechanical Polishing Composition for Copper Comprising ZeoliteAbandonedMar 29, 07Dec 03, 09[C09K, H01L]
2008/0096,385 SLURRY COMPOSITION FOR FORMING TUNGSTEN PATTERN AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE USING THE SAMEAbandonedSep 27, 07Apr 24, 08[C09K, H01L]
2005/0261,151 Corrosion-inhibiting cleaning compositions for metal layers and patterns on semiconductor substratesAbandonedJan 06, 05Nov 24, 05[C11D]
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