TOKYO ELECTRON LIMITED

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Patent Activity in the Last 10 Years

Technologies

Intl Class Technology MATTERS Rank in Class
 
 
H01L SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR 2651 16
 
 
C23C COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL 1292 2
 
 
H01J ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS 560 5
 
 
C23F NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACES 421 1
 
 
B08B CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL 397 1
 
 
G06F ELECTRIC DIGITAL DATA PROCESSING 280 213
 
 
G01R MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES 263 27
 
 
G03F PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR 228 18
 
 
B05C APPARATUS FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL 210 1
 
 
B05D PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL 149 6
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Top Patents (by citation)

Recent Publications

Publication # Title Filing Date Pub Date Intl Class
2018/0073,146 Antenna Device, Plasma Generating Device Using the Same, and Plasma Processing Apparatus Sep 05, 17 Mar 15, 18 [H01Q, C23C, H01J]
2018/0073,911 METHOD OF INSPECTING GAS SUPPLY SYSTEM, METHOD OF CALIBRATING FLOW CONTROLLER, AND METHOD OF CALIBRATING SECONDARY REFERENCE DEVICE Sep 13, 17 Mar 15, 18 [G01F]
2018/0076,021 SUBSTRATE PROCESSING APPARATUS Sep 08, 17 Mar 15, 18 [C23C, H01L]
2018/0076,030 SiC FILM FORMING METHOD AND SiC FILM FORMING APPARATUS Sep 06, 17 Mar 15, 18 [C23C, H01L]
2018/0076,057 SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD Sep 08, 17 Mar 15, 18 [H01L]
2018/0076,066 SUBSTRATE PROCESSING METHOD, SUBSTRATE PROCESSING SYSTEM AND SUBSTRATE PROCESSING APPARATUS Mar 28, 16 Mar 15, 18 [G03F, H01L]
2018/0065,065 TREATMENT SOLUTION SUPPLY APPARATUS Sep 06, 17 Mar 08, 18 [G03F, B01D]
2018/0065,843 SUBSTRATE TREATMENT METHOD, COMPUTER STORAGE MEDIUM AND SUBSTRATE TREATMENT SYSTEM Feb 10, 16 Mar 08, 18 [B81C, H01L]
2018/0066,221 BUFFER TANK AND CULTURE SYSTEM Sep 01, 17 Mar 08, 18 [C12M]
2018/0066,363 VORTICAL ATOMIZING NOZZLE ASSEMBLY, VAPORIZER, AND RELATED METHODS FOR SUBSTRATE PROCESSING SYSTEMS May 22, 17 Mar 08, 18 [C23C, B01F]

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Recent Patents

Patent # Title Filing Date Issue Date Intl Class
9920422 Method and apparatus of forming silicon nitride film Dec 30, 15 Mar 20, 18 [C23C, H01L]
9920424 Method of cleaning thin film forming apparatus, thin film forming method, thin film forming apparatus and non-transitory recording medium Dec 23, 13 Mar 20, 18 [C23C, H01L]
9921089 Flow rate range variable type flow rate control apparatus Jun 02, 16 Mar 20, 18 [G01F, G05D]
9921478 Negative tone developer compatible photoresist composition and methods of use Jun 26, 15 Mar 20, 18 [G03F]
9922802 Power supply system, plasma etching apparatus, and plasma etching method Feb 19, 13 Mar 20, 18 [G05B, H05H, H01J, H01L]
9922806 Etching method and plasma processing apparatus Jun 13, 16 Mar 20, 18 [H01J, H01L]
9922820 Film forming method and film forming apparatus Jan 31, 17 Mar 20, 18 [C23C, H01J, H01L]
9922824 Method of forming silicon film Dec 22, 15 Mar 20, 18 [C23C, H01L]
9922835 Plating method, plating apparatus, and storage medium Aug 19, 15 Mar 20, 18 [B05D, H01L]
9922841 Plasma processing method Dec 04, 15 Mar 20, 18 [B44C, C23F, H01J, C03C, H01L]

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Expired/Abandoned/Withdrawn Patents

Patent # Title Status Filing Date Issue/Pub Date Intl Class
2017/0170,021 SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD AND RECORDING MEDIUM Abandoned Dec 09, 16 Jun 15, 17 [C23C, H01L]
2017/0117,460 METHOD OF MANUFACTURING MAGNETORESISTIVE ELEMENT AND SYSTEM FOR MANUFACTURING MAGNETORESISTIVE ELEMENT Abandoned Oct 19, 16 Apr 27, 17 [H01L]
2017/0069,472 METHOD FOR CLEANING A PROCESS CHAMBER Abandoned Mar 17, 15 Mar 09, 17 [B08B, H01J]
2017/0069,497 PLASMA ETCHING METHOD Abandoned May 01, 15 Mar 09, 17 [H01J, H01L]
2017/0025,308 METHOD OF CLEANING BOTTOM OF VIA HOLE AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE Abandoned Mar 09, 16 Jan 26, 17 [H01L]
2016/0372,306 Method for Controlling Plasma Uniformity in Plasma Processing Systems Abandoned Nov 18, 15 Dec 22, 16 [H01J]
2016/0363,868 LINE PATTERN COLLAPSE MITIGATION THROUGH GAP-FILL MATERIAL APPLICATION Abandoned Jul 29, 16 Dec 15, 16 [G03F]
2016/0351,398 SEMICONDUCTOR ELEMENT MANUFACTURING METHOD Abandoned May 26, 16 Dec 01, 16 [H01J, H01L]
2016/0336,201 SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD Abandoned Jul 26, 16 Nov 17, 16 [B08B, H01L]
2016/0326,646 METHOD FOR FORMING MANGANESE-CONTAINING FILM Abandoned Jul 18, 16 Nov 10, 16 [C23C, H01L]
2016/0307,784 SUBSTRATE PROCESSING SYSTEM Abandoned Apr 19, 16 Oct 20, 16 [G05B, H01L]
2016/0293,454 SUBSTRATE PROCESSING DEVICE Abandoned Mar 18, 14 Oct 06, 16 [H01J, H01L]
2016/0280,536 Method for Manufacturing Hollow Structure Abandoned Mar 17, 14 Sep 29, 16 [B81C]
2016/0276,147 Silicon Nitride Film Forming Method and Silicon Nitride Film Forming Apparatus Abandoned Mar 10, 16 Sep 22, 16 [C23C, H01L]
2016/0260,587 SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD Abandoned Feb 24, 16 Sep 08, 16 [H01J]
2016/0247,765 SEMICONDUCTOR DEVICE, PLATING METHOD, PLATING SYSTEM AND RECORDING MEDIUM Abandoned Feb 19, 16 Aug 25, 16 [C23C, H01L]
2016/0211,145 METHOD FOR ETCHING GROUP III-V SEMICONDUCTOR AND APPARATUS FOR ETCHING THE SAME Abandoned Jan 19, 16 Jul 21, 16 [H01L]
2016/0203,998 ETCHING METHOD Abandoned Sep 02, 14 Jul 14, 16 [H01L]
2016/0189,963 DOPING METHOD AND SEMICONDUCTOR ELEMENT MANUFACTURING METHOD Abandoned Dec 21, 15 Jun 30, 16 [H01L]
2016/0181,109 SEMICONDUCTOR DEVICE MANUFACTURING METHOD Abandoned Feb 26, 16 Jun 23, 16 [H01L]

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