TOKYO OHKA KOGYO CO., LTD.

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Technologies

Intl Class Technology # of Patents Rank
 
 
 
G03F PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR 3107
 
 
 
G03C PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES 5812
 
 
 
B05D PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL 2444
 
 
 
H01L SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR 24233
 
 
 
B32B LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM18103
 
 
 
C07C ACYCLIC OR CARBOCYCLIC COMPOUNDS 1789
 
 
 
C11D DETERGENT COMPOSITIONS 1738
 
 
 
C08F MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS 1685
 
 
 
B05C APPARATUS FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL 1323
 
 
 
B08B CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL 841

Top Patents (by citation)

Patent # Title Filing Date Issue Date Intl Class Cited #
5,945,517 Chemical-sensitization photoresist compositionJul 21, 98Aug 31, 99[C07D, C07C]105
5,571,324 Rotary-cup coating apparatusJul 20, 94Nov 05, 96[B05B]102
5,349,978 Cleaning device for cleaning planar workpieceJun 04, 93Sep 27, 94[B08B]95
6,153,733 (Disulfonyl diazomethane compounds)May 13, 99Nov 28, 00[C07C]77
5,795,702 Photoresist stripping liquid compositions and a method of stripping photoresists using the sameSep 24, 96Aug 18, 98[G03C, C11D]62
5,714,625 Cyanooxime sulfonate compoundSep 12, 96Feb 03, 98[C07C]59
5,435,880 Plasma processing apparatusOct 14, 93Jul 25, 95[C23F]58
7,074,543 Positive resist composition and method of forming resist pattern from the sameNov 29, 02Jul 11, 06[G03F]52
6,063,953 Chemical-sensitization photoresist compositionJan 26, 99May 16, 00[C07C]41
5,905,063 Remover solution composition for resist and method for removing resist using the sameJun 03, 98May 18, 99[7./2, C11D, 7/50]33

Recent Publications

Publication # Title Filing Date Pub Date Intl Class
2013/0109,123 DIFFUSING AGENT COMPOSITION AND METHOD OF FORMING IMPURITY DIFFUSION LAYERJul 06, 11May 02, 13[H01L]
2013/0095,427 RESIST COMPOSITION FOR EUV OR EB AND METHOD OF FORMING RESIST PATTERNOct 12, 12Apr 18, 13[G03F]
2013/0089,819 RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, POLYMERIC COMPOUND, AND COMPOUNDJun 14, 11Apr 11, 13[G03F]
2013/0089,821 RESIST PATTERN FORMATION METHOD AND PATTERN MINIATURIZATION AGENTMay 27, 11Apr 11, 13[G03F]
2013/0081,760 ADHESIVE COMPOSITION, ADHESIVE FILM, AND METHOD FOR TREATING SUBSTRATESep 27, 12Apr 04, 13[C09J, B32B]
2013/0084,523 RESIST COMPOSITIOIN AND METHOD OF FORMING RESIST PATTERNSep 21, 12Apr 04, 13[G03F]
2013/0078,572 RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERNSep 21, 12Mar 28, 13[G03F]
2013/0071,789 RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERNSep 14, 12Mar 21, 13[G03F]
2013/0061,922 DIFFUSION AGENT COMPOSITION, METHOD OF FORMING IMPURITY DIFFUSION LAYER, AND SOLAR CELLApr 12, 11Mar 14, 13[C09D, H01L]
2013/0065,180 RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERNSep 06, 12Mar 14, 13[G03F]

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Recent Patents

Patent # Title Filing Date Issue Date Intl Class
8,425,713 Bonding apparatus, method for preventing dissolving of adhesive agent, and bonding methodApr 11, 08Apr 23, 13[B32B]
8,426,107 Positive-type photosensitive compositionMay 13, 09Apr 23, 13[G03F, B32B]
8,426,543 Adhesive composition and adhesive filmSep 27, 07Apr 23, 13[C08F]
8,415,082 Resist composition, method of forming resist pattern, compound and method of producing the same, acid generatorApr 22, 10Apr 09, 13[G03C, G03F]
8,415,085 Resist composition, method of forming resist pattern, novel compound, and acid generatorMay 23, 12Apr 09, 13[G03F]
8,409,360 Cleaning method for a process of liquid immersion lithographyMay 03, 10Apr 02, 13[B08B, C11D]
8,409,431 Charging apparatusSep 25, 08Apr 02, 13[B01D]
8,409,781 Composition for formation of resist protection film, and method for formation of resist pattern using the sameSep 14, 07Apr 02, 13[G03C, G03F]
8,409,783 Copolymer, resin composition, spacer for display panel, planarization film, thermosetting protective film, microlens, and process for producing copolymerSep 29, 08Apr 02, 13[C08F, G03F]
8,410,296 Surface treatment agent and surface treatment methodNov 10, 10Apr 02, 13[C07F]

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Top Inventors for This Owner

Inventor Name Address # of Patent/Pub
Hada Hideo
Kawasaki-shi, JP
152
Nakayama Toshimasa
Kanagawa, JP
113
Shiono Daiju
Kawasaki-shi, JP
84
Iwai Takeshi
Kawasaki-shi, JP
81
Shimizu Hiroaki
Kawasaki-shi, JP
79
Wakiya Kazumasa
Kanagawa-ken, JP
69
Utsumi Yoshiyuki
Not Provided
66
Dazai Takahiro
Not Provided
65
Hirano Tomoyuki
Kanagawa, JP
59
Kohara Hidekatsu
Kanagawa, JP
59