TOPPAN PHOTOMASKS, INC.

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Patent Activity in the Last 10 Years

Technologies

Intl Class Technology Matters Rank in Class
 
  
 
G03F PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR 797
 
  
 
F16M FRAMES, CASINGS, OR BEDS, OF ENGINES OR OTHER MACHINES OR APPARATUS, NOT SPECIFIC TO AN ENGINE, MACHINE, OR APPARATUS PROVIDED FOR ELSEWHERE; STANDS OR SUPPORTS332
 
  
 
F16F SPRINGS; SHOCK-ABSORBERS; MEANS FOR DAMPING VIBRATION257
 
  
 
G06F ELECTRIC DIGITAL DATA PROCESSING 2445
 
  
 
H01L SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR 2360
 
  
 
B32B LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM1156
 
  
 
B65D CONTAINERS FOR STORAGE OR TRANSPORT OF ARTICLES OR MATERIALS, e.g. BAGS, BARRELS, BOTTLES, BOXES, CANS, CARTONS, CRATES, DRUMS, JARS, TANKS, HOPPERS, FORWARDING CONTAINERS; ACCESSORIES, CLOSURES, OR FITTINGS THEREFOR; PACKAGING ELEMENTS; PACKAGES 197
 
  
 
G01B MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS198
 
  
 
G01C MEASURING DISTANCES, LEVELS OR BEARINGS; SURVEYING; NAVIGATION; GYROSCOPIC INSTRUMENTS; PHOTOGRAMMETRY OR VIDEOGRAMMETRY 1104
 
  
 
G01F MEASURING VOLUME, VOLUME FLOW, MASS FLOW, OR LIQUID LEVEL; METERING BY VOLUME 158

Top Patents (by citation)

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Recent Publications

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Recent Patents

Patent # Title Filing Date Issue Date Intl Class
8833722 Apparatus for transport of equipment and method for manufacture thereofApr 28, 10Sep 16, 14[F16M, F16F]
8833723 Apparatus for transport of equipment and method for manufacture thereofSep 23, 11Sep 16, 14[F16M, F16F]
8347793 Apparatus for transport of equipment and method for manufacture thereofApr 28, 10Jan 08, 13[B65D]
8172194 Apparatus for transport of equipment and method for manufacture thereofMay 22, 09May 08, 12[F16M]
7906350 Method for calibrating a metrology toolJan 04, 10Mar 15, 11[H01L, G01R]
7663156 Method and apparatus for calibrating a metrology toolJan 13, 06Feb 16, 10[H01L]
7531275 Photomask assembly and method for protecting the same from contaminants generated during a lithography processJul 26, 06May 12, 09[G03F]
7425393 Phase shift photomask and method for improving printability of a structure on a waferMay 15, 06Sep 16, 08[G03F]
7271950 Apparatus and method for optimizing a pellicle for off-axis transmission of lightFeb 15, 01Sep 18, 07[G02B]
7094505 Photomask assembly and method for protecting the same from contaminants generated during a lithography processOct 29, 03Aug 22, 06[G01F]

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Expired/Abandoned/Withdrawn Patents

Patent # Title Status Filing Date Issue/Pub Date Intl Class
2010/0215,909 Photomask for the Fabrication of a Dual Damascene Structure and Method for Forming the SameAbandonedSep 06, 06Aug 26, 10[B32B, B44C]
2010/0100,349 Method and System for Automatically Generating Do-Not-Inspect Regions of a PhotomaskAbandonedDec 22, 09Apr 22, 10[G06F]
2010/0086,212 Method and System for Dispositioning Defects in a PhotomaskAbandonedJan 29, 07Apr 08, 10[G06K]
2009/0166,319 System and Method for Performing High Flow Rate Dispensation of a Chemical onto a Photolithographic ComponentAbandonedJul 19, 07Jul 02, 09[G03F, B44C]
2009/0046,281 Method and System for Automated Inspection System Characterization and MonitoringAbandonedAug 16, 07Feb 19, 09[G01N, G03F]
2009/0004,077 Apparatus and Method for Preventing Haze Growth on a Surface of a SubstrateAbandonedFeb 12, 07Jan 01, 09[A61L]
2008/0248,408 Photomask and Method for Forming a Non-Orthogonal Feature on the SameAbandonedSep 06, 06Oct 09, 08[G03F]
2008/0241,709 System And Method For analyzing photomask GeometriesAbandonedApr 02, 07Oct 02, 08[G03F]
7398509 Network-based photomask data entry interface and instruction generator for manufacturing photomasksExpiredNov 18, 05Jul 08, 08[G06F]
2007/0178,665 Systems And Methods For Forming Integrated Circuit Components Having Precise CharacteristicsAbandonedJan 25, 07Aug 02, 07[H01L]
2007/0160,919 Phase-Shift Mask Providing Balanced Light Intensity Through Different Phase-Shift Apertures And Method For Forming Such Phase-Shift MaskAbandonedMar 23, 07Jul 12, 07[G03C, G03F]
2007/0111,461 Systems And Methods For Forming Integrated Circuit Components Having Matching GeometriesAbandonedJan 12, 07May 17, 07[H01L]
2006/0269,851 Photomask and method for conveying information associated with a photomask substrateAbandonedAug 07, 06Nov 30, 06[G03F]
2006/0134,534 Photomask and method for maintaining optical properties of the sameAbandonedFeb 07, 06Jun 22, 06[G21G, B08B, G03C, A61N, G03F]
7056623 Photomask and method for manufacturing the sameExpiredJan 24, 03Jun 06, 06[G03F]
6968530 Network-based photomask data entry interface and instruction generator for manufacturing photomasksExpiredSep 08, 03Nov 22, 05[G06F]
2005/0207,638 System and method for automatically transferring a defect image from an inspection system to a databaseAbandonedMay 20, 05Sep 22, 05[G06K]
2005/0208,393 Photomask and method for creating a protective layer on the sameAbandonedMay 20, 05Sep 22, 05[G03C, G03F]
6910203 Photomask and method for qualifying the same with a prototype specificationExpiredDec 09, 02Jun 21, 05[G06F]
6899981 Photomask and method for detecting violations in a mask pattern file using a manufacturing ruleExpiredNov 21, 02May 31, 05[G03F]

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