ULTRATECH STEPPER, INC.

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Patent Activity in the Last 10 Years

Technologies

Intl Class Technology Matters Rank in Class
 
  
 
G03B APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR 592
 
  
 
G02B OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS 3202
 
  
 
G21K TECHNIQUES FOR HANDLING PARTICLES OR ELECTROMAGNETIC RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA- OR X-RAY MICROSCOPES 145
 
  
 
H01S DEVICES USING STIMULATED EMISSION191

Top Patents (by citation)

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Recent Publications

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Recent Patents

Patent # Title Filing Date Issue Date Intl Class
5757470 Variable annular illuminator for photolithographic projection imagerAug 17, 95May 26, 98[G03B]
5691541 Maskless, reticle-free, lithographyMay 14, 96Nov 25, 97[G21K]
5488514 Method of mounting an optical elementMar 16, 95Jan 30, 96[G02B]
5461456 Spatial uniformity varier for microlithographic illuminatorFeb 27, 95Oct 24, 95[G03B]
5452054 Variable annular illuminator for photolithographic projection imagerNov 21, 94Sep 19, 95[G03B]
5428482 Decoupled mount for optical element and stacked annuli assemblyJun 18, 93Jun 27, 95[G02B, H01S]
5383000 Partial coherence varier for microlithographic systemNov 24, 92Jan 17, 95[G03B]
5353166 Mounting system for optical annulus in lens assemblyOct 06, 92Oct 04, 94[G02B]
5281996 Photolithographic reduction imaging of extended fieldSep 04, 92Jan 25, 94[G03B]

Expired/Abandoned/Withdrawn Patents

Patent # Title Status Filing Date Issue/Pub Date Intl Class
5644137 Stabilizing support mechanism for electron beam apparatusExpiredMar 04, 96Jul 01, 97[G01B]
5455427 Lithographic electron-beam exposure apparatus and methodsExpiredApr 28, 93Oct 03, 95[H01J]
5402205 Alignment system for a Half-Field Dyson projection systemExpiredDec 21, 92Mar 28, 95[G03B]
5363196 Apparatus for measuring a departure from flatness or straightness of a nominally-plane mirror for a precision X-Y movable-stageExpiredJan 10, 92Nov 08, 94[G01B]
5359388 Microlithographic projection systemExpiredApr 02, 93Oct 25, 94[G03B]
5329332 System for achieving a parallel relationship between surfaces of wafer and reticle of half-field dyson stepperExpiredDec 21, 92Jul 12, 94[G03B]
5303001 Illumination system for Half-Field Dyson stepperExpiredDec 21, 92Apr 12, 94[G03B]
5298939 Method and apparatus for transfer of a reticle pattern onto a substrate by scanningExpiredNov 04, 91Mar 29, 94[G03B]
5266790 Focusing technique suitable for use with an unpatterned specular substrateExpiredDec 21, 92Nov 30, 93[G01J]
5166530 Illuminator for microlithographic integrated circuit manufactureExpiredDec 20, 91Nov 24, 92[H01K]
5164794 Optical reticle inspection system and methodExpiredJul 15, 91Nov 17, 92[G01B]
5155554 Large aperture reflective interferometer for measuring convex spherical surfacesExpiredDec 20, 90Oct 13, 92[G01B]
5101226 Distance and tilt sensing apparatusExpiredOct 22, 90Mar 31, 92[G03B]
5094641 Apparatus and method for protecting, installing and removing mercury-vapor lampsExpiredAug 01, 90Mar 10, 92[H01K]
5083757 Rotational flexure stageExpiredJul 05, 90Jan 28, 92[F16F]
5070235 Accumulated exposure detection with exposure terminating attenuatorExpiredJun 18, 90Dec 03, 91[G01J]
5040882 Unit magnification optical system with improved reflective reticleExpiredMay 18, 90Aug 20, 91[G02B]
5031977 Deep ultraviolet (UV) lens for use in a photolighography systemExpiredDec 27, 89Jul 16, 91[G02B]
5020083 X-ray masks, their fabrication and useExpiredMay 19, 89May 28, 91[G21K]
5008705 Autofocus system for microlithographyExpiredApr 23, 90Apr 16, 91[G03B]

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