ULVAC COATING CORPORATION

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Patent Activity in the Last 10 Years

Technologies

Intl Class Technology Matters Rank in Class
 
  
 
G03F PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR 1391
 
  
 
G01F MEASURING VOLUME, VOLUME FLOW, MASS FLOW, OR LIQUID LEVEL; METERING BY VOLUME 257
 
  
 
B32B LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM1156
 
  
 
C23C COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL 1100
 
  
 
C23F NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACES 135
 
  
 
G06F ELECTRIC DIGITAL DATA PROCESSING 1446
 
  
 
H01H ELECTRIC SWITCHES; RELAYS; SELECTORS; EMERGENCY PROTECTIVE DEVICES 193

Top Patents (by citation)

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Recent Publications

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Recent Patents

Patent # Title Filing Date Issue Date Intl Class
8216745 Half-tone mask, half-tone mask blank and method for manufacturing half-tone maskOct 29, 08Jul 10, 12[G06F]
7282308 Phase shifter film and process for the sameJun 30, 06Oct 16, 07[G03F]
7090947 Phase shifter film and process for the sameMar 13, 01Aug 15, 06[G01F]
7063922 Method and apparatus for dry-etching half-tone phase-shift films, half-tone phase-shift photomasks and method for the preparation thereof, and semiconductor circuits and method for the fabrication thereofNov 14, 03Jun 20, 06[G01F]
7001698 Method and apparatus for dry-etching half-tone phase-shift films, half-tone phase-shift photomasks and method for the preparation thereof, and semiconductor circuits and method for the fabrication thereofNov 14, 03Feb 21, 06[G03F]
6689515 Phase-shifting photomask blank, phase-shifting photomask, method for producing them and apparatus for manufacturing the blankMar 15, 01Feb 10, 04[G03F]
6685848 METHOD AND APPARATUS FOR DRY-ETCHING HALF-TONE PHASE-SHIFT FILMS HALF-TONE PHASE-SHIFT PHOTOMASKS AND METHOD FOR THE PREPARATION THEREOF AND SEMICONDUCTOR CIRCUITS AND METHOD FOR THE FABRICATION THEREOFJul 27, 99Feb 03, 04[C23F]
6569577 Phase-shift photo mask blank, phase-shift photo mask and method for fabricating semiconductor devicesNov 03, 00May 27, 03[G03F]
6288457 Key switch device and portable key electronic device provided with the key switch deviceSep 08, 99Sep 11, 01[H01H]
6228541 Phase-shifting photomask blank, phase-shifting photomask, method for producing them and apparatus for manufacturing the blankApr 16, 99May 08, 01[G03F, B32B]

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Expired/Abandoned/Withdrawn Patents

Patent # Title Status Filing Date Issue/Pub Date Intl Class
2010/0294,651 PROCESS FOR PRODUCING GRAY TONE MASKAbandonedOct 09, 08Nov 25, 10[C23C]
2010/0273,098 MASK BLANK, PRODUCTION METHOD OF MASK BLANK AND PRODUCTION METHOD OF MASKAbandonedDec 22, 08Oct 28, 10[G03F]
2005/0230,750 Cathode substrate and its manufacturing methodAbandonedFeb 28, 05Oct 20, 05[H01L]
2004/0094,504 Method and apparatus for dry-etching half-tone phase-shift films, half-tone phase-shift photomasks and method for the preparation thereof, and semiconductor circuits and method for the fabrication thereofAbandonedNov 14, 03May 20, 04[C23F, B44C]
2003/0183,599 High selective ratio and high and uniform plasma processing method and systemAbandonedMar 21, 03Oct 02, 03[C03C]
2002/0155,723 Dry-etching method and apparatus, photomasks and method for the preparation thereof, and semiconductor circuits and method for the fabrication thereofAbandonedMar 28, 02Oct 24, 02[H01L, C23F]

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