ULVAC JAPAN, LTD.,

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Patent Activity in the Last 10 Years

Technologies

Intl Class Technology Matters Rank in Class
 
  
 
H01L SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR 3359
 
  
 
C23F NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACES 234
 
  
 
B05D PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL 186
 
  
 
C23C COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL 1100

Top Patents (by citation)

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Recent Publications

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Recent Patents

Patent # Title Filing Date Issue Date Intl Class
6682772 High temperature deposition of Pt/TiOx for bottom electrodesApr 24, 00Jan 27, 04[B05D]
6495413 Structure for masking integrated capacitors of particular utility for ferroelectric memory integrated circuitsFeb 28, 01Dec 17, 02[H01L]
5908319 Cleaning and stripping of photoresist from surfaces of semiconductor wafersApr 24, 96Jun 01, 99[H01L]
5882489 Processes for cleaning and stripping photoresist from surfaces of semiconductor wafersApr 26, 96Mar 16, 99[C23C, H01L, C23F]
5795831 Cold processes for cleaning and stripping photoresist from surfaces of semiconductor wafersOct 16, 96Aug 18, 98[C23F]

Expired/Abandoned/Withdrawn Patents

Patent # Title Status Filing Date Issue/Pub Date Intl Class
2003/0071,294 Process and structure for masking integrated capacitors of particular utility for ferroelectric memory integrated circuitsAbandonedOct 30, 02Apr 17, 03[H01L]
4832810 Co-based alloy sputter target and process of manufacturing the sameExpiredJul 07, 87May 23, 89[C23C]
4683176 Optical magnetic recording memberExpiredAug 15, 84Jul 28, 87[G11B]
4661420 Optical magnetic recording memberExpiredFeb 05, 85Apr 28, 87[G11B]
4655167 Apparatus for manufacturing of abrasion resistant magnetic recording productExpiredJun 18, 85Apr 07, 87[C23C]
4624767 Sputter etching apparatus having a second electrically floating electrode and magnet meansExpiredFeb 20, 85Nov 25, 86[C23C]
4624867 Process for forming a synthetic resin film on a substrate and apparatus thereforExpiredMar 21, 85Nov 25, 86[C23C]
4611121 Magnet apparatusExpiredApr 18, 84Sep 09, 86[H01J]
4587179 Magnetic recording medium and manufacturing process thereofExpiredNov 07, 83May 06, 86[G11B]
4581245 Method of manufacturing of abrasion resisting magnetic recording productExpiredDec 21, 82Apr 08, 86[B05D]
4412907 Ferromagnetic high speed sputtering apparatusExpiredJul 23, 82Nov 01, 83[C23C]
4401546 Ferromagnetic high speed sputtering apparatusExpiredMar 25, 82Aug 30, 83[C23C]

Top Inventors for This Owner

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