UWIZ TECHNOLOGY CO., LTD.

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Patent Activity in the Last 10 Years

Technologies

Intl Class Technology Matters Rank in Class
 
  
 
C09G POLISHING COMPOSITIONS OTHER THAN FRENCH POLISH; SKI WAXES810
 
  
 
H01L SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR 6356
 
  
 
C09K MATERIALS FOR APPLICATIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR590
 
  
 
B24B MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING 264
 
  
 
C11D DETERGENT COMPOSITIONS 263
 
  
 
C23F NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACES 234
 
  
 
B24D TOOLS FOR GRINDING, BUFFING, OR SHARPENING 129
 
  
 
C03C CHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS159
 
  
 
C09C TREATMENT OF INORGANIC MATERIALS, OTHER THAN FIBROUS FILLERS, TO ENHANCE THEIR PIGMENTING OR FILLING PROPERTIES 129

Top Patents (by citation)

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Recent Publications

Publication # Title Filing Date Pub Date Intl Class
2017/0253,766 SLURRY COMPOSITION, USE THEREOF, AND POLISHING METHODJun 08, 16Sep 07, 17[B24B, C09G, C23F]

Recent Patents

Patent # Title Filing Date Issue Date Intl Class
9881803 Chemical mechanical polishing method using slurry composition containing N-oxide compoundJul 21, 16Jan 30, 18[H01L, C09G]
9718991 Chemical mechanical polishing slurryMay 28, 15Aug 01, 17[C09K, C09G]
9530655 Slurry composition for chemical mechanical polishing of Ge-based materials and devicesSep 08, 14Dec 27, 16[B24B, C09K, H01L, C09G]
9493678 Polishing compositionJan 15, 15Nov 15, 16[H01L, C09G]
9416297 Chemical mechanical polishing method using slurry composition containing N-oxide compoundNov 13, 13Aug 16, 16[C09G]
9165760 Cleaning composition and cleaning method using the sameOct 16, 13Oct 20, 15[H01L, C11D]
9039925 Polishing slurry compositionAug 07, 12May 26, 15[C09K, H01L, C03C, C09G, C23F]
8901001 Slurry composition and method of fabricating damascene structure using the sameAug 25, 09Dec 02, 14[C09K, H01L, C09G]
8747693 Silica having metal ions absorbed thereon and fabricating method thereofSep 13, 12Jun 10, 14[C09K, C01B]
8641920 Polishing composition for planarizing metal layerJun 11, 09Feb 04, 14[C09K]

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Expired/Abandoned/Withdrawn Patents

Patent # Title Status Filing Date Issue/Pub Date Intl Class
2011/0160,112 CLEANING COMPOSITIONAbandonedOct 05, 10Jun 30, 11[C11D]
2010/0193,728 Chemical Mechanical Polishing CompositionAbandonedAug 05, 08Aug 05, 10[C09K]

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