VERITY INSTRUMENTS, INC.

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Patent Activity in the Last 10 Years

Technologies

Intl Class Technology Matters Rank in Class
 
  
 
G01J MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRA-RED, VISIBLE OR ULTRA-VIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY 771
 
  
 
H01L SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR 5357
 
  
 
G01B MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS396
 
  
 
G01N INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES 3203
 
  
 
H05B ELECTRIC HEATING; ELECTRIC LIGHTING NOT OTHERWISE PROVIDED FOR 2109
 
  
 
B24B MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING 165
 
  
 
G01R MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES 1158
 
  
 
G06F ELECTRIC DIGITAL DATA PROCESSING 1446
 
  
 
H01J ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS 1127
 
  
 
H04N PICTORIAL COMMUNICATION, e.g. TELEVISION 1241

Top Patents (by citation)

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Recent Publications

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Recent Patents

Patent # Title Filing Date Issue Date Intl Class
9842726 Method and apparatus for the detection of arc events during the plasma processing of a wafer, surface of substrateAug 12, 10Dec 12, 17[H01J, H01L]
9801265 High dynamic range measurement system for process monitoringFeb 17, 16Oct 24, 17[G01J, H05B, G01N]
9772226 Referenced and stabilized optical measurement systemJul 11, 11Sep 26, 17[G01J, G01N]
9383323 Workpiece characterization systemJun 22, 11Jul 05, 16[G01N]
9386241 Apparatus and method for enhancing dynamic range of charge coupled device-based spectrographJul 02, 03Jul 05, 16[H04N, G01J]
9310250 High dynamic range measurement system for process monitoringApr 24, 15Apr 12, 16[G01J, H05B]
8125633 Calibration of a radiometric optical monitoring system used for fault detection and process monitoringMay 06, 08Feb 28, 12[G01J]
7630859 Method and apparatus for reducing the effects of window clouding on a viewport window in a reactive environmentMay 01, 07Dec 08, 09[G06F]
7589843 Self referencing heterodyne reflectometer and method for implementingSep 27, 06Sep 15, 09[G01B]
7545503 Self referencing heterodyne reflectometer and method for implementingSep 27, 05Jun 09, 09[G01B]

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Expired/Abandoned/Withdrawn Patents

Patent # Title Status Filing Date Issue/Pub Date Intl Class
2016/0131,587 Method and Apparatus for Monitoring Pulsed Plasma ProcessesAbandonedOct 07, 14May 12, 16[H01J, G01N]
2010/0216,263 Method and Apparatus for Measuring Process Parameters of a Plasma Etch ProcessAbandonedJan 31, 08Aug 26, 10[H01L]
2008/0233,016 Multichannel array as window protectionAbandonedMar 21, 07Sep 25, 08[B01J]
2006/0285,120 Method for monitoring film thickness using heterodyne reflectometry and grating interferometryAbandonedJul 10, 05Dec 21, 06[G01B]
2006/0012,796 Plasma treatment apparatus and light detection method of a plasma treatmentAbandonedJul 14, 04Jan 19, 06[G01B]
6768543 Wafer inspection apparatus with unique illumination methodology and method of operationExpiredOct 30, 02Jul 27, 04[G01N]
5816476 Dual frequency power supply and transducerExpiredMay 10, 96Oct 06, 98[B23K]
5595330 Power supplyExpiredAug 24, 94Jan 21, 97[B23K]
5364005 Ultrasonic transducer and mountExpiredNov 08, 93Nov 15, 94[H01L]

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