Nabila Baba-Ali

Inventor

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Work History

Patent OwnerApplications FiledYear
ASML HOLDING N.V. AND ASML NETHERLANDS B.V.
1
2005
ASML NETHERLANDS B.V.
1
2005
ASML HOLDING N.V.
1
4
2
3
3
2003
2004
2005
2006
2007

Inventor Addresses

AddressDuration
Paris, FROct 19, 06 - Sep 15, 09
Ridgefield, CTMay 25, 06 - Nov 04, 08
Ridgefield, CT, USApr 21, 09 - Jan 05, 10

Technology Profile

Technology # of Patents
G02B: OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS 8
G03B: APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR 2
G03F: PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR 1

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Patents / Publication

Patents / Publication #Year of Publication / IssuedTitleCitations
7,643,1922010Pattern generator using a dual phase step element and method of using same0
7,589,8192009Method for the generation of variable pitch nested lines and/or contact holes using fixed size pixels for direct-write lithographic systems3
7,520,6262009Pattern generator using a dual phase step element and method of using same4
7,445,8832008Lithographic printing with polarized light28
7,400,3822008Light patterning device using tilting mirrors in a superpixel form5

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