Hideharu Kyouda

Inventor

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Work History

Patent OwnerApplications FiledYear
TOKYO ELECTRON LIMITED
1
2
8
1
2
12
3
3
8
2
2001
2002
2004
2005
2006
2007
2008
2010
2011
2012

Inventor Addresses

AddressDuration
Kikuchi-gun, JPMar 23, 04 - Jan 31, 06
Kikuyo-Machi, JPFeb 23, 10 - Feb 23, 10
Koshi City, JPSep 16, 10 - Jun 07, 12
Koshi, JPJun 22, 10 - Feb 05, 13
Koshi, KRAug 30, 11 - Aug 30, 11
Koshi-Shi, JPMar 01, 07 - Aug 30, 12
Koshi-shi, JPMar 20, 08 - Mar 15, 12
Kukuchi-gun, JPOct 13, 09 - Oct 13, 09
Kumamoto, JPDec 17, 02 - Mar 25, 10
Kumamoto-Ken, JPAug 02, 07 - Aug 09, 07
Tokyo, JPAug 31, 06 - Aug 31, 06

Technology Profile

Technology # of Patents
B05B: SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES 2
B05C: APPARATUS FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL 8
B05D: PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL 3

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Patents / Publication

Patents / Publication #Year of Publication / IssuedTitleCitations
8,366,8722013Substrate treatment method, coating film removing apparatus, and substrate treatment system0
8,366,8722013Substrate treatment method, coating film removing apparatus, and substrate treatment system0
2012/0218,5312012DEVELOPING METHOD AND APPARATUS USING ORGANIC-SOLVENT CONTAINING DEVELOPER0
2012/0140,1912012COATING AND DEVELOPING APPARATUS, COATING AND DEVELOPING METHOD, AND STORAGE MEDIUM0
8,163,4692012Coating and developing apparatus, coating and developing method, and storage medium0

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