Han-Jin Lim

Inventor

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Work History

Patent OwnerApplications FiledYear
TECHNO SEMICHEM CO., LTD.
2
2006
SAMSUNG ELECTRONICS CO., LTD.
1
1
2
3
3
2
4
2
4
2
2
2
1999
2001
2002
2003
2004
2005
2006
2009
2010
2011
2013
2014
L'AIR LIQUIDE, SOCIETE ANONYME POUR L'ETUDE ET L'EXPLOITATION DES PROCEDES GEORGES CLAUDE
1
2003

Inventor Addresses

AddressDuration
Seoul, KRSep 04, 01 - Dec 18, 14

Technology Profile

Technology Matters
B05D: PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL 1
C07F: ACYCLIC, CARBOCYCLIC, OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM, OR TELLURIUM 2
C23C: COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL 1

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Patents / Publication

Patents / Publication #Year of Publication / IssuedTitleCitations
2014/0367,7742014Semiconductor Devices Having Partially Oxidized Gate Electrodes0
2014/0264,7782014PRECURSOR COMPOSITION FOR DEPOSITION OF SILICON DIOXIDE FILM AND METHOD FOR FABRICATING SEMICONDUCTOR DEVICE USING THE SAME0
2014/0231,9582014CAPACITORS HAVING DIELECTRIC LAYERS WITH DIFFERENT BAND GAPS AND SEMICONDUCTOR DEVICES USING THE SAME0
2014/0158,9642014Semiconductor Devices Having Blocking Layers and Methods of Forming the Same0
8,481,3982013Method of forming semiconductor device having a capacitor0

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