Han-Jin Lim

Inventor

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Work History

Patent OwnerApplications FiledYear
TECHNO SEMICHEM CO., LTD.
2
2006
NAMLAB GGMBH
1
2015
SAMSUNG ELECTRONICS CO., LTD.
1
1
2
3
3
2
4
2
4
3
3
14
2
1999
2001
2002
2003
2004
2005
2006
2009
2010
2011
2013
2014
2015
L'AIR LIQUIDE, SOCIETE ANONYME POUR L'ETUDE ET L'EXPLOITATION DES PROCEDES GEORGES CLAUDE
1
2003

Inventor Addresses

AddressDuration
Seoul, KRSep 04, 01 - Jan 28, 16

Technology Profile

Technology Matters
B05D: PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL 1
C07F: ACYCLIC, CARBOCYCLIC, OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM, OR TELLURIUM 2
C23C: COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL 2

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Patents / Publication

Patents / Publication #Year of Publication / IssuedTitleCitations
2016/0027,7862016SEMICONDUCTOR DEVICES HAVING SELF-ALIGNED CONTACT PADS0
9,240,4142016Semiconductor devices having self-aligned contact pads0
9,230,9222016Precursor composition for deposition of silicon dioxide film and method for fabricating semiconductor device using the same0
2015/0357,3992015CAPACITORS INCLUDING AMORPHOUS DIELECTRIC LAYERS AND METHODS OF FORMING THE SAME0
9,202,8132015Electrode structure, method of fabricating the same, and semiconductor device including the electrode structure0

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