Tsuneyuki Okabe

Inventor

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Work History

Patent OwnerApplications FiledYear
TOYO TANSO CO., LTD.
2
2007
FUJIKIN INCORPORATED
3
1
1
1
2001
2002
2005
2013
SOKEN-INDUSTRIES
2
2006
HORIBA STEC, CO., LTD.
2
2007
CKD CORPORATION
1
1
1
2
4
2
2001
2002
2005
2006
2007
2010
TOKYO ELECTRON LIMITED
3
2
3
3
8
11
2
3
2
3
3
2
2001
2003
2004
2005
2006
2007
2008
2009
2010
2011
2012
2013

Inventor Addresses

AddressDuration
Hanamaki, JPJan 25, 11 - Jan 25, 11
Hanamaki-shi, JPMar 20, 08 - Mar 20, 08
Iwate, JPApr 19, 12 - Oct 07, 14
Kai, JPNov 18, 08 - Feb 26, 13
Kai-shi, JPMar 30, 06 - May 17, 07
Kanagawa-ken, JPJun 17, 04 - Jun 17, 04
Minato-ku, JPApr 24, 14 - Apr 24, 14
Nirasaki, JPMar 23, 10 - Mar 05, 13
Oshu, JPMar 18, 08 - Feb 12, 13
Oshu-Shi, JPNov 03, 11 - Nov 03, 11
Oshu-shi, JPDec 27, 07 - Oct 23, 14
Shiroyama-Machi, JPNov 09, 04 - Nov 09, 04
Tokyo, JPOct 20, 05 - Jul 10, 12
Tokyo-To, JPApr 28, 05 - Mar 31, 09
Tsukui-gun, JPSep 13, 01 - May 07, 02
Yamanashi, JPJan 24, 08 - Mar 18, 10

Technology Profile

Technology # of Patents
B01D: SEPARATION 1
B01F: MIXING, e.g. DISSOLVING, EMULSIFYING, DISPERSING 2
B01J: CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS, COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS 1

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Patents / Publication

Patents / Publication #Year of Publication / IssuedTitleCitations
2014/0312,6172014PIPE JOINT0
8,851,1062014Gas supplying apparatus, cylinder cabinet provided with the same, valve box, and substrate process apparatus0
2014/0110,9372014PIPE JOINT0
2014/0080,3202014SEMICONDUCTOR PROCESSING SYSTEM INCLUDING VAPORIZER AND METHOD FOR USING SAME0
2013/0092,2642013FLOW RATE CONTROLLER AND PROCESSING APPARATUS0

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