Coil filament for plasma enhanced chemical vapor deposition source
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United States of America Patent
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Oct 23, 2018
Grant Date -
Dec 21, 2017
app pub date -
Nov 20, 2015
filing date -
Dec 5, 2014
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Abstract
A vapor deposition source that includes a substantially vertical plate to which first and second filament posts are coupled. The vapor deposition source also includes a filament having a first end and a second end. The filament provides a substantially concentric source of electrons. The first end of the filament is connected to the first filament post and the second end of the filament is connected to the second filament post. The first end of the filament is substantially vertically aligned with the second end of the filament when the filament is connected to the first and second posts.
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