Sputtering target

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United States of America Patent

PATENT NO 10138544
APP PUB NO 20140202852A1
SERIAL NO

14127759

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Abstract

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A method for casting a reactive material PVD target, as well as targets thus obtained and a mold for casting. The method includes providing a mold defining an opening, placing a reactive material ingot in to a reservoir (140) proximate the mold, forming a vacuum and melting the reactive material in the reservoir, heating the mold to above a casting temperature and forming a vacuum therein, introducing molten reactive material from the reservoir into the opening and cooling the mold to form the PVD target.

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Patent Owner(s)

Patent OwnerAddress
SOLERAS LTD589 ELM STREET BIDDEFORD ME 04005

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Asbas, Michael Alfred, US 6 17
Carter, Paul G East Waterboro, US 1 2
Ferrin, Lawrence C Lebanon, US 1 2
Laverriere, Guy P Biddeford, US 3 8
Plaisted, Dean T Kennebunk, US 1 2

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