Method of treating gas and gas treatment device
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United States of America Patent
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Jan 1, 2019
Grant Date -
Nov 16, 2017
app pub date -
May 9, 2017
filing date -
May 13, 2016
priority date (Note) -
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Abstract
Method of treating gas and gas treatment device, the gas treatment device comprising: a first chamber, comprising a first inlet, a first outlet and a first energy supply system, allowing the gas to enter the first chamber through the first inlet; a second chamber comprising a second outlet and a second energy supply system; a third chamber comprising a third inlet in communication with the first outlet and the second outlet; and a fourth chamber comprising a fourth inlet and a scrubbing system containing a solvent comprising water molecules (H2O), wherein the third outlet of the third chamber is in communication with the fourth inlet of the fourth chamber.
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