Polishing composition for magnetic disc substrate

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United States of America Patent

PATENT NO 10233357
APP PUB NO 20170321086A1
SERIAL NO

15590787

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Abstract

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Embodiments provide a polishing composition for a magnetic disc substrate including colloidal silica, a phosphorus-containing compound, a water-soluble polymer compound, and water. According to at least one embodiment, the water-soluble polymer compound is a copolymer having a structural unit derived from an unsaturated aliphatic carboxylic acid and a structural unit derived from an unsaturated amide.

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Patent Owner(s)

  • YAMAGUCHI SEIKEN KOGYO CO., LTD.

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Ando, Junichiro Aichi, JP 6 3

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