Methods for etching a workpiece, an apparatus configured to etch a workpiece, and a non-transitory computer readable medium
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United States of America Patent
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Apr 2, 2019
Grant Date -
Sep 24, 2015
app pub date -
Jun 10, 2015
filing date -
Jul 22, 2013
priority date (Note) -
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status (Latency Note)
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Abstract
A method for etching a workpiece may be provided, which may include: determining a plurality of reference etch profiles for a plurality of positions of an etchant dispenser, each reference etch profile corresponding to a respective position of the plurality of positions of the etchant dispenser; determining a thickness profile of the workpiece; determining a respective etch duration for each position of the plurality of positions of the etchant dispenser based on the determined thickness profile and the plurality of reference etch profiles, to reduce a total thickness variation of the workpiece; and dispensing an etchant over the workpiece via the etchant dispenser for the determined respective etch duration for each position of the plurality of positions.
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Cited Art Landscape
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