Methods for pre-cleaning conductive materials on a substrate
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United States of America Patent
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May 7, 2019
Grant Date -
Apr 6, 2017
app pub date -
Sep 29, 2016
filing date -
Oct 2, 2015
priority date (Note) -
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Abstract
Methods for processing a substrate are provided herein. In some embodiments, a method of processing a substrate includes: heating a substrate disposed within a processing volume of a substrate processing chamber to a temperature of up to about 400 degrees Celsius, wherein the substrate comprises a first surface, an opposing second surface, and an opening formed in the first surface and extending towards the opposing second surface, and wherein the second surface comprises a conductive material disposed in the second surface and aligned with the opening; and exposing the substrate to a process gas comprising about 80 to about 100 wt. % of an alcohol to reduce a contaminated surface of the conductive material.
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