Unit for supplying liquid, apparatus for treating a substrate, and method for treating a substrate
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United States of America Patent
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May 14, 2019
Grant Date -
Nov 1, 2018
app pub date -
Apr 13, 2018
filing date -
Apr 28, 2017
priority date (Note) -
In Force
status (Latency Note)
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Abstract
An apparatus and a method for performing liquid treatment with respect to a substrate are provided. The apparatus includes a substrate supporting unit that supports and rotates the substrate, and a liquid supplying unit that supplies a liquid onto the substrate supported by the substrate supporting unit. The liquid supplying unit includes a nozzle unit that supplies a first treatment liquid and a second treatment liquid, and a moving unit that moves the nozzle unit. The nozzle unit has a first slit discharge port for discharging the first treatment liquid in a liquid curtain manner, a second slit discharge port for discharging the second treatment liquid in the liquid curtain manner, and a wetting liquid discharge port for discharging a pre-wetting liquid. The treatment liquids are selectively supplied depending on films formed on the substrate, thereby easily coping with the substrate having various types of films.
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