Selective metal/metal oxide etch process

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United States of America Patent

PATENT NO 10297465
APP PUB NO 20160322236A1
SERIAL NO

15108945

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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The present invention provides a process for selectively etching molybdenum or titanium relative to a oxide semiconductor film, including providing a substrate comprising a layer of oxide semiconductor and a layer comprising molybdenum or titanium on the layer of oxide semiconductor; preparing the substrate by applying a photoresist layer over the layer comprising molybdenum or titanium, and then patterning and developing the photoresist layer to form an exposed portion of the layer comprising molybdenum or titanium; providing a composition comprising ammonia or ammonium hydroxide, a quaternary ammonium hydroxide and a peroxide; and applying the composition to the exposed portion for a time sufficient to etch and remove the exposed portion of the layer comprising molybdenum or titanium, wherein the etching selectively removes the molybdenum or titanium relative to the oxide semiconductor.

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Patent Owner(s)

Patent OwnerAddress
SACHEM INC821 EAST WOODWARD STREET AUSTIN TX 78704

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Allen, Craig Austin, US 8 8
Vermeulen, Paul Eindhoven, NL 7 17

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