Photomask and a fabrication method therefor

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 10345692
APP PUB NO 20180149960A1
SERIAL NO

15399205

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Abstract

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A method of fabricating a photomask includes depositing a phase shifter over a light transmitting substrate, depositing a shading layer over the light transmitting substrate, and removing a portion of the shading layer and a portion of the phase shifter to expose a portion of the light transmitting substrate. The phase shifter having at least two semiconductor layers and at least two dielectric layers.

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Patent Owner(s)

Patent OwnerAddress
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTDNO 8 LI-HSIN RD 6 HSINCHU SCIENCE PARK HSINCHU 300-78

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Chen, Chun-Lang Madou Township, TW 55 312
Tu, Chih-Chiang Tauyen, TW 85 480
Yang, Shih-Hao Tainan, TW 14 20

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