Substrate treatment method using a block copolymer containing a hydrophilic and a hydrophobic polymers
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United States of America Patent
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Sep 17, 2019
Grant Date -
Oct 5, 2017
app pub date -
Sep 15, 2015
filing date -
Sep 24, 2014
priority date (Note) -
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Abstract
A substrate treatment method of treating a substrate using a block copolymer containing a hydrophilic polymer and a hydrophobic polymer, includes: a resist pattern formation step of forming a predetermined resist pattern by a resist film on the substrate; a thin film formation step of forming a thin film for suppressing deformation of the resist pattern on a surface of the resist pattern; a block copolymer coating step of applying a block copolymer to the substrate after the formation of the thin film; and a polymer separation step of phase-separating the block copolymer into the hydrophilic polymer and the hydrophobic polymer.
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International Classification(s)
- C08J:WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTE....
- H01J:ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01L:SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICE....
- H05H:PLASMA TECHNIQUE
- G03D:APPARATUS FOR PROCESSING EXPOSED PHOTOGRAPHIC MATE....
- D06M:TREATMENT, NOT PROVIDED FOR ELSEWHERE IN CLASS D0....
- G03F:PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNE....
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