Lithographic method

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United States of America Patent

PATENT NO 10437154
APP PUB NO 20180081278A1
SERIAL NO

15789702

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Abstract

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A method of patterning lithographic substrates, the method comprising using a free electron laser to generate EUV radiation and delivering the EUV radiation to a lithographic apparatus which projects the EUV radiation onto lithographic substrates, wherein the method further comprises reducing fluctuations in the power of EUV radiation delivered to the lithographic substrates by using a feedback-based control loop to monitor the free electron laser and adjust operation of the free electron laser accordingly.

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Patent Owner(s)

Patent OwnerAddress
ASML NETHERLANDS B VP O BOX 324 VELDHOVEN 5500 AH

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Akkermans, Johannes Antonius Gerardus Veldhoven, NL 15 65
Engelen, Wouter Joep Veldhoven, NL 16 88
Frijns, Olav Waldemar Vladimir Rosmalen, NL 22 174
Loopstra, Erik Roelof Eindhoven, NL 325 13468
Nikipelov, Andrey Alexandrovich Eindhoven, NL 13 123

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