Wafer dryer apparatus and method

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 10473396
APP PUB NO 20180031317A1
SERIAL NO

15782233

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Importance

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Abstract

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Wafers on a first wafer carrier in a tank are lifted from the first wafer carrier and a bath in the tank so as to accomplish Marangoni drying of the wafers. The lifted dry wafers are positioned on a second wafer carrier in a chamber and shifted to an offset position. A barrier, which can be a wall of the chamber with or without a sweeping flow of gas, impedes the passage of deposits to the wafers arising during drying of the first wafer carrier. Static electricity can be discharged from wafer supports in the offset position.

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First Claim

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Patent Owner(s)

Patent OwnerAddress
MEI WET PROCESSING SYSTEMS & SERVICES LLC3838 WESTERN WAY NE ALBANY OR 97321

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Tice, Scott Albany, US 7 15

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