Composition and method for polishing memory hard disks exhibiting reduced edge roll off

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 10479911
SERIAL NO

16000062

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Abstract

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The invention provides a chemical-mechanical polishing composition comprising (a) an abrasive comprising colloidal silica and fused silica, (b) a compound of formula (I) or a combination of a compound of formula (II) and a hydrophobic organic compound, (c) an amino acid, (d) hydrogen peroxide, and (e) water, wherein the polishing composition has a pH of about 1 to about 5. The invention also provides a method of chemically-mechanically polishing a substrate, especially a nickel-phosphorous substrate, by contacting the substrate with the inventive chemical-mechanical polishing composition.

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Patent Owner(s)

Patent OwnerAddress
CMC MATERIALS LLC1209 ORANGE STREET WILMINGTON DE 19801

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Palanisamy, Chinnathambi Selvaraj Singapore, SG 11 36

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