Conductive composition, antistatic film, laminate and production therefor, and production method for photomask

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United States of America Patent

PATENT NO 10488757
APP PUB NO 20170261854A1
SERIAL NO

15309973

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Abstract

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This conductive composition includes: a conductive polymer (a) having a sulfonic acid group and/or a carboxy group; a basic compound (b) having at least one nitrogen-containing heterocyclic ring and an amino group; an aqueous polymer (c) having a hydroxyl group (excluding the conductive polymer (a)); a hydrophilic organic solvent (d); and water (e).

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Patent Owner(s)

Patent OwnerAddress
MITSUBISHI CHEMICAL CORPORATIONCHIYODA-KU TOKYO 100-8251

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Fukuda, Hiroya Toyohashi, JP 21 121
Uzawa, Masashi Toyohashi, JP 26 114
Yamazaki, Akira Toyohashi, JP 205 3133

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