Integrated device comprising a capacitor and inductor structure comprising a shared interconnect for a capacitor and an inductor

Number of patents in Portfolio can not be more than 2000

United States of America

PATENT NO 10498307
SERIAL NO

15705035

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Abstract

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An integrated device that includes a substrate, a first interconnect over the substrate and a second interconnect comprising a first portion and a second portion. The integrated device further comprising a first dielectric layer between the first interconnect and the first portion of the second interconnect such that the first interconnect vertically overlaps with the first dielectric layer and the first portion of the second interconnect. The integrated device also includes a second dielectric layer formed over the substrate. The first interconnect, the first dielectric layer and the first portion of the second interconnect are configured to operate as a capacitor. The first portion and the second portion of the second interconnect are configured to operate as an inductor.

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Patent Owner(s)

  • QUALCOMM INCORPORATED

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Berdy, David Francis San Diego, US 61 433
Gu, Shiqun San Diego, US 165 3169
Kim, Jonghae San Diego, US 314 3456
Mudakatte, Niranjan Sunil San Diego, US 45 222
Velez, Mario Francisco San Diego, US 123 1131
Yun, Changhan Hobie San Diego, US 135 897
Zuo, Chengjie San Diego, US 146 1294

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