Apparatus for treating substrate and method for cleaning guide plate
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United States of America
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Jan 14, 2020
Grant Date -
Jun 1, 2017
app pub date -
Nov 29, 2016
filing date -
Nov 29, 2016
priority date (Note) -
In Force
status (Latency Note)
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Abstract
The present disclosure relates to an apparatus for treating a substrate. The apparatus for treating a substrate includes a cup having an inner space whose top is open, a supporting unit for supporting a substrate in the inner space, a guide plate provided to surround the supporting unit, a treatment solution supplying unit for supplying a treatment solution to an upper surface of the substrate supported by the supporting unit, and a cleaning solution supplying unit for supplying a cleaning solution to an upper surface of the guide plate.
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