Lithography patterning with flexible solution adjustment
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United States of America
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Jan 14, 2020
Grant Date -
Nov 22, 2018
app pub date -
Jul 30, 2018
filing date -
Jul 30, 2018
priority date (Note) -
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Abstract
A system for lithography patterning includes a first supply pipe for supplying a first solution; a second supply pipe for supplying a second solution; a third supply pipe coupled to the first and second supply pipes for receiving the first and second solutions respectively and mixing the first and second solutions into a mixture; a substrate stage for holding a substrate; a supply nozzle coupled to the third supply pipe for dispensing the mixture to the substrate; a first control unit coupled to the first supply pipe and configured to control a flow rate of the first solution going to the third supply pipe; and a second control unit coupled to the second supply pipe and configured to control a flow rate of the second solution going to the third supply pipe.
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