Substrate cleaning apparatus and substrate processing apparatus

Number of patents in Portfolio can not be more than 2000

United States of America

PATENT NO 10546764
APP PUB NO 20170236730A1
SERIAL NO

15432471

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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A substrate cleaning apparatus comprises: a cleaning member 11,21 that comes into contact with a substrate W and cleans the substrate W; a member rotating unit 15, 25 that rotates the cleaning member 11, 21; a pressing drive unit 19, 29 that presses the cleaning member 11, 21 against the substrate W; a torque detecting unit 16, 26 for detecting torque applied to the member rotating unit 15, 25; and a control unit 50 that controls pressing force on the basis of a result of detection by the torque detecting unit 16, 26.

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Patent Owner(s)

  • EBARA CORPORATION

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Imamura, Akira Tokyo, JP 85 727
Kunisawa, Junji Tokyo, JP 67 550
Matsuzawa, Shunsuke Tokyo, JP 2 5
Miyazaki, Mitsuru Tokyo, JP 78 433

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