Method of forming a directed self-assembled layer on a substrate

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United States of America

PATENT NO 10551741
APP PUB NO 20190155159A1
SERIAL NO

16094119

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Abstract

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A method of forming a directed self-assembled (DSA) layer on a substrate by: providing a substrate; applying a layer comprising a self-assembly material on the substrate; and annealing of the self-assembly material of the layer to form a directed self-assembled layer by providing a controlled temperature and gas environment around the substrate. The controlled gas environment comprises molecules comprising an oxygen element with a partial pressure between 10-2000 Pa.

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Patent Owner(s)

  • ASM IP HOLDING B.V.; IMEC VZW

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Gronheid, Roel Huldenberg, BE 28 628
Knaepen, Werner Leuven, BE 43 5521
Maes, Jan Willem Wilrijk, BE 106 15548
Sriraman, Hari Pathangi Leuven, BE 6 40
Stokhof, Maarten Winksele, BE 6 952

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