Self-cleaning film system and method of forming same
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United States of America
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Feb 11, 2020
Grant Date -
Nov 22, 2018
app pub date -
May 18, 2017
filing date -
May 18, 2017
priority date (Note) -
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Abstract
A self-cleaning film system includes a substrate and a film. The film includes a monolayer formed from fluorinated material and a first plurality of regions disposed within the monolayer and spaced apart from one another such that each of the first plurality of regions abuts, is surrounded by, and is not covered by the fluorinated material. Each of the first regions includes a photocatalytic material. A method of forming a self-cleaning film system includes depositing a monolayer formed from fluorinated material onto a substrate. After depositing, the method includes ablating the monolayer to define a first plurality of cavities therein, wherein each of the first cavities is spaced apart from an adjacent one of the first cavities along the monolayer. After ablating, the method includes embedding a photocatalytic material into each of the first plurality of cavities to form a film on the substrate and thereby form the film system.
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