Self-cleaning film system and method of forming same

Number of patents in Portfolio can not be more than 2000

United States of America

PATENT NO 10556231
APP PUB NO 20180333710A1
SERIAL NO

15598845

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Abstract

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A self-cleaning film system includes a substrate and a film. The film includes a monolayer formed from fluorinated material and a first plurality of regions disposed within the monolayer and spaced apart from one another such that each of the first plurality of regions abuts, is surrounded by, and is not covered by the fluorinated material. Each of the first regions includes a photocatalytic material. A method of forming a self-cleaning film system includes depositing a monolayer formed from fluorinated material onto a substrate. After depositing, the method includes ablating the monolayer to define a first plurality of cavities therein, wherein each of the first cavities is spaced apart from an adjacent one of the first cavities along the monolayer. After ablating, the method includes embedding a photocatalytic material into each of the first plurality of cavities to form a film on the substrate and thereby form the film system.

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Patent Owner(s)

Patent OwnerAddress
GM GLOBAL TECHNOLOGY OPERATIONS LLCP O BOX 300 DETROIT MI 48265-3000

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Carpenter, James A Rochester Hills, US 30 101
Dadheech, Gayatri V Bloomfield Hills, US 23 92
Seder, Thomas A Fraser, US 105 3946

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