Photoresist stripping apparatus, and methods of stripping photoresist and forming thin film pattern using the same

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United States of America

PATENT NO 10564549
APP PUB NO 20180203360A1
SERIAL NO

15692437

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Abstract

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A method of forming a thin film pattern includes providing a thin film on a substrate, providing a photoresist on the thin film, forming a first photoresist pattern having a first packing density by exposing and developing the photoresist, etching the thin film by using the first photoresist pattern as a mask, processing the first photoresist pattern to convert the first photoresist pattern into a second photoresist pattern having a second packing density, which is lower than the first packing density, and stripping the second photoresist pattern by spraying steam onto the second photoresist pattern.

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Patent Owner(s)

  • SAMSUNG DISPLAY CO., LTD.

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Choung, Jong Hyun Yongin-si, KR 19 52
Jeong, Beung Hwa Yongin-si, KR 11 70
Kim, Sung Chul Yongin-si, KR 108 690

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