Self-cleaning film system and method of forming same

Number of patents in Portfolio can not be more than 2000

United States of America

PATENT NO 10569263
APP PUB NO 20180333711A1
SERIAL NO

15945259

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Abstract

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A method of forming a film system includes depositing a monolayer formed from a fluorocarbon onto a substrate. After depositing, the method includes ablating the monolayer to define a plurality of cavities therein, wherein each of the plurality of cavities is spaced apart from an adjacent one of the plurality of cavities along the monolayer. After ablating, the method includes embedding a photocatalytic material into each of the plurality of cavities to form a film on the substrate and thereby form the film system. The film system includes a plurality of regions including the photocatalytic material and disposed within the monolayer such that each of the plurality of regions abuts and is surrounded by the fluorocarbon.

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Patent Owner(s)

Patent OwnerAddress
GM GLOBAL TECHNOLOGY OPERATIONS LLCP O BOX 300 DETROIT MI 48265-3000

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Carpenter, James A Rochester Hills, US 30 101
Dadheech, Gayatri V Bloomfield Hills, US 23 92
Seder, Thomas A Fraser, US 105 3946

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