Substrate cleaning apparatus and substrate processing apparatus

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United States of America

PATENT NO 10575697
APP PUB NO 20180289230A1
SERIAL NO

15946607

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Abstract

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Various examples of a substrate cleaning apparatus and a substrate processing apparatus are described in the present disclosure. One example of the present invention is a substrate cleaning apparatus including a roll cleaning member cleaning a substrate, an inclination sensor detecting an inclination of the roll cleaning member, and an output device outputting a detection result of the inclination sensor.

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Patent Owner(s)

  • EBARA CORPORATION

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Imamura, Akira Tokyo, JP 85 727
Kunisawa, Junji Tokyo, JP 67 551
Miyazaki, Mitsuru Tokyo, JP 78 434

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