CMP compositions containing polymer complexes and agents for STI applications

Number of patents in Portfolio can not be more than 2000

United States of America

PATENT NO 10584266
APP PUB NO 20190284434A1
SERIAL NO

15920813

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Abstract

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The invention relates to a chemical-mechanical polishing composition comprising (a) ceria abrasive particles, (b) a cationic polymer, (c) a nonionic polymer comprising polyethylene glycol octadecyl ether, polyethylene glycol lauryl ether, polyethylene glycol oleyl ether, poly(ethylene)-co-poly(ethylene glycol), octylphenoxy poly(ethyleneoxy)ethanol, or a combination thereof, (d) a saturated monoacid, and (e) an aqueous carrier. The invention also relates to a method of polishing a substrate.

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Patent Owner(s)

  • CABOT MICROELECTRONICS CORPORATION

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Brosnan, Sarah St. Charles, US 12 9

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