Method for measuring beam to beam stitch error in the presence of variable width beams
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United States of America
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Mar 18, 2019
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Mar 18, 2019
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Abstract
According to aspects of the embodiments, there is provided process and architecture for enabling multiple digital micromirror devices (DMDs) that include optical modulation elements configured to modulate light outputting from a light source, and a projection unit configured to project light modulated by the optical modulation elements on a printing plate. Image defects due to misalignment in the cross-process direction of the output from the DMDs are discovered by using a single test pattern image and combined with knowledge of how individual pixels are rendered to register printing elements which can render a variable number of pixels. Misalignment errors can be corrected by selecting a different set of mirrors for a given DMD.
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