Sputtering target for forming magnetic recording film and method for producing same

Number of patents in Portfolio can not be more than 2000

United States of America

PATENT NO 10600440
APP PUB NO 20170294203A1
SERIAL NO

15513017

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Abstract

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An FePt-based sintered sputtering target containing C and/or BN, wherein an area ratio of AgCu alloy grains on a polished surface of a cross section that is perpendicular to a sputtered surface of the sputtering target is 0.5% or more and 15% or less. An object of this invention is to provide a sputtering target capable of reducing particles generation during sputtering and efficiently depositing a magnetic thin film of a magnetic recording medium.

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Patent Owner(s)

  • JX NIPPON MINING & METALS CORPORATION

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Ogino, Shin-ichi Ibaraki, JP 24 169

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