Nanoparticle structure and process for manufacture

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United States of America

PATENT NO 10604407
APP PUB NO 20180200786A1
SERIAL NO

15801987

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Abstract

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A method for forming nanoparticles includes forming a stack of alternating layers including a first material disposed between a second material. The stack of alternating layers is patterned to form pillars. A dielectric layer is conformally deposited over the pillars. The pillars are annealed in an oxygen environment to modify a shape of the first material of the alternating layers. The dielectric layer and the second material are etched selectively to the first material to form nanoparticles from the first material.

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Patent Owner(s)

  • INTERNATIONAL BUSINESS MACHINE CORPORATION

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Cao, Qing Yorktown Heights, US 149 560
Cheng, Kangguo Schenectady, US 3065 29582
Li, Juntao Cohoes, US 577 3094

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