Antireflection film containing inorganic particles and manufacturing method thereof

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United States of America

PATENT NO 10605960
APP PUB NO 20180372917A1
SERIAL NO

15747084

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Abstract

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An antireflection film including a hard coating layer; and a low refractive index layer including a binder resin and hollow and solid-type inorganic nanoparticles dispersed in the binder resin. The solid-type inorganic nanoparticles are distributed more than the hollow inorganic nanoparticles near the interface between the hard coating layer and the low refractive index layer. The hollow inorganic nanoparticles have a thickness of a shell layer to a particle radius ratio of 0.3 or less. A method for manufacturing an antireflection film including: coating a resin composition including a photocurable compound or a (co)polymer thereof, a fluorine-containing compound containing a photoreactive functional group, a photoinitiator, and hollow and solid-type inorganic nanoparticles onto a hard coating layer, drying at a temperature of 35° C. to 100° C. and photocuring the same. The hollow inorganic nanoparticles have a ratio of the thickness of a shell layer to the particle radius of 0.3 or less.

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Patent Owner(s)

Patent OwnerAddress
XINMEI FONTANA HOLDING (HONG KONG) LIMITEDWORKSHOP 60 3/F BLK A EAST SUN IND CTR NO 16 SHING YIP ST KL HONG KONG

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Byun, Jin Seok Daejeon, KR 48 228
Chang, Yeong Rae Daejeon, KR 116 659
Kim, Jae Young Daejeon, KR 185 1101

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