Apparatus and method for developing a photoresist coated substrate

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 10698313
APP PUB NO 20190155151A1
SERIAL NO

16179724

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Abstract

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An apparatus includes a developing tank and a fluid manifold in the bottom of the developing tank. The fluid manifold includes a plurality of holes through which developer flows and a plurality of valves corresponding to the plurality of holes. The valves allow developer to flow through the holes when open and prevent developer from flowing through the holes when closed. A trench surrounds the fluid manifold through which developer is drained from the developing tank. A controller is configured to control opening and closing of the valves. In an embodiment, the apparatus includes a clamping mechanism configured to insert the substrate into and remove the substrate from the developing tank.

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Patent Owner(s)

Patent OwnerAddress
TAIWAN SEMICONDUCTOR MANUFACTURING CO LTDHSINCHU 300-78

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Chen, Ching-Yueh Hsinchu County, TW 14 15
Chen, Chun-Lang Tainan County, TW 55 312
Liu, Tzung-Shiun Tainan, TW 5 4

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