Nozzle cleaning device, nozzle cleaning method, and substrate processing apparatus
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United States of America Patent
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Jun 30, 2020
Grant Date -
Dec 5, 2013
app pub date -
May 29, 2013
filing date -
May 31, 2012
priority date (Note) -
In Force
status (Latency Note)
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Abstract
A nozzle cleaning device is capable of uniformly cleaning a nozzle from a front end of the nozzle to an upper part thereof. The nozzle cleaning device includes a storage tank, a liquid discharging portion and an overflow discharging portion. The storage tank has a cylindrical inner peripheral surface and is configured to store therein a cleaning liquid that cleans a nozzle used in a substrate process. The liquid discharging portion is configured to discharge the cleaning liquid into the storage tank toward a position eccentric with respect to a central axis of the cylindrical inner peripheral surface to store the cleaning liquid within the storage tank and configured to form a vortex flow of the cleaning liquid revolving within the storage tank. The overflow discharging portion is configured to discharge the cleaning liquid that overflows the storage tank.
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