Method for the material-saving production of wafers and processing of wafers

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United States of America Patent

PATENT NO 10843380
APP PUB NO 20180243944A1
SERIAL NO

15565499

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Abstract

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The invention relates to a method for producing a multi-layer assembly. The method according to the invention comprises at least the following steps: providing a donor substrate (2) for removing a solid layer (4), in particular a wafer; producing modifications (12), in particular by means of laser beams (10), in the donor substrate (2) in order to specify a crack course; providing a carrier substrate (6) for holding the solid layer (4); bonding the carrier substrate (6) to the donor substrate (2) by means of a bonding layer (8), wherein the carrier substrate (6) is provided for increasing the mechanical strength of the solid layer (4) for the further processing, which solid layer is to be removed; arranging or producing a stress-producing layer (16) on the carrier substrate (6); thermally loading the stress-producing layer (16) in order to produce stresses in the donor substrate (2), wherein a crack is triggered by the stress production, which crack propagates along the specified crack course in order to remove the solid layer (4) from the donor substrate (2) such that the solid layer (4) is removed together with the bonded carrier substrate (6).

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Patent Owner(s)

Patent OwnerAddress
SILTECTRA GMBH01099 DRESDEN

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Drescher, Wolfram Dresden, DE 36 83
Richter, Jan Dresden, DE 79 579
Schilling, Franz Radeberg, DE 13 67

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