Crack-resistant silicon-based planarizing compositions, methods and films

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United States of America Patent

PATENT NO 10947412
APP PUB NO 20190185708A1
SERIAL NO

16210153

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Abstract

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A composition for planarizing a semiconductor device surface includes a silicon-based material and a cross-linker including a siloxane compound according to the general formula:

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Patent Owner(s)

Patent OwnerAddress
HONEYWELL INTERNATIONAL INC115 TABOR ROAD MAIL STOP 4D3 MORRIS PLAINS NJ 07950

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Huang, Hong Min Shanghai, CN 14 90
Xu, Helen Xiao Sunnyvale, US 4 1

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