Crack-resistant polysiloxane dielectric planarizing compositions, methods and films

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United States of America Patent

PATENT NO 11015082
APP PUB NO 20190185709A1
SERIAL NO

16210160

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Abstract

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A composition for planarizing a semiconductor device surface includes a catalyst, at least one solvent, and at least one polysiloxane resin including polysilsesquioxane blocks and polydisiloxane blocks. The polydisiloxane blocks are according to the general formula:

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Patent Owner(s)

Patent OwnerAddress
HONEYWELL INTERNATIONAL INC855 SOUTH MINT STREET CHARLOTTE NC 28202

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Huang, Hong Min Shanghai, CN 14 90
Xu, Helen Xiao Sunnyvale, US 4 1

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