Method of forming at least one channel within a substrate and a system

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United States of America Patent

PATENT NO 11020888
APP PUB NO 20200016803A1
SERIAL NO

16033914

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Abstract

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A method of forming at least one channel within a substrate includes coupling a fitting to a mold, and securing together the fitting and an insert via threads. A system includes a mold configured to form the substrate. The method also includes inserting a component into an opening of the fitting. Part of the component is disposed outside of the opening of the fitting, and the component is utilized to define the at least one channel within the substrate. The method further includes molding at least one material to the component and the insert to form the substrate. Furthermore, the method includes removing the fitting from the insert while the insert remains molded to the substrate.

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Patent Owner(s)

Patent OwnerAddress
GM GLOBAL TECHNOLOGY OPERATIONS LLC300 RENAISSANCE CENTER DETROIT MI 48265-3000

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Coppola, Anthony M Rochester Hills, US 47 217
Kia, Hamid G Bloomfield Hills, US 111 1386

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