Self-assembly composition for pattern formation and pattern forming method
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United States of America Patent
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Sep 14, 2021
Grant Date -
Jul 11, 2019
app pub date -
Feb 27, 2017
filing date -
May 20, 2016
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Abstract
It is an object of the present invention to provide a self-assembly composition for pattern formation having a wide range of applicable pattern size and being capable of forming a favorable phase-separated structure. The present invention relates to a self-assembly composition for pattern formation, which comprises a block copolymer comprising a polymerization unit (a) having at least one selected from a structure represented by the following formula (103) and a structure represented by the following formula (104), and a polymerization unit (b) having a structure represented by the following formula (105), wherein the content rate of a sugar moiety in the block copolymer is 3% by mass or more and 80% by mass or less based on the total mass of the block copolymer:
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